Fundamental mechanisms of focused ion beam guided anodization

Ideally ordered 10 nm channel arrays grown by anodization of focused-ion-beam patterned aluminum

Arrays of ideally ordered alumina nanochannels with unprecedented ,10 nm pore size, 40–50 nm interpore spacing, and improved channel uniformity have been fabricated by anodizing an aluminum substrate with a guiding pattern on its surface. The pattern is an array of hexagonally close-packed concaves fabricated by focused ion beam direct sputtering; and its lattice constant is carefully matched t...

Focused Ion Beam Lithography

Focused Ion Beam Microscopy and Micromachining

The FIB Instrument The basic functions of the FIB, namely, imaging and sputtering with an ion beam, require a highly focused beam. A consistent tenet of any focused beam is that the smaller the effective source size, the more current that can be focused to a point. Unlike the broad ion beams generated from plasma sources, high-resolution ion beams are defined by the use of a field ionization so...

Sculpting on polymers using focused ion beam

Available online 13 June 2008 It has been recently shown t

Nanoimprint Mold Manufacturing with Focused Ion Beam

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-45 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key challenge in expense and resolution. Focused Ion Beams (FIB) has been known for high resolution but low throughput work in TEM sample preparation, and its extremely well defined 7 nm diameter Ga beam make it als...